Research Publications

S. Sohail H. NAQVI
Rector
Refereed Articles
Naqvi S S, McNeil J R (1999). Optical scatterometry for process metrology. Optical Metrology: A Critical Review, doi:
Minhas B K, Coulombe S A, Naqvi S S, McNeil J R (1998). Ellipsometric scatterometry for the metrology of sub-0.1-um-linewidth structures. Applied optics, doi:
Coulombe S A, Minhas B K, Raymond C J, McNeil J R (1998). Scatterometry measurement of sub-0.1 um linewidth gratings. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer, doi:
McNeil J R, Coulombe S A, Logofatu P C, Raymond C J, Naqvi S S (1998). Application of optical scatterometry to microelectronics and flat panel display processing. Scattering and Surface Roughness II, doi:
Raymond C J, Murnane M R, Prins S L, Sohail S, Naqvi H (1997). Multiparameter grating metrology using optical scatterometry. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer, doi:
Minhas B K, Prins S L, Naqvi S S, McNeil J R (1996). Toward sub-0.1-um CD measurements using scatterometry. Metrology, Inspection, and Process Control for Microlithography X, doi:
Blattner P, Herzig H P, Sohail S, Naqvi H (1995). Scanning spot metrology for testing of photolithographic masks. Optical Engineering, doi:
Murnane M R, Raymond C J, Naqvi S S, McNeil J R (1995). Subwavelength photoresist grating metrology using scatterometry. Application and Theory of Periodic Structures, doi:
Hatab Z R, McNeil J R (1995). Sixteen-megabit dynamic random access memory trench depth characterization using two-dimensional diffraction analysis. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer, doi:
Raymond C J, Murnane M R, Sohail S, Naqvi H, McNeil J R (1995). Metrology of subwavelength photoresist gratings using optical scatterometry. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer, doi:
Sohail S, Naqvi H, Zaidi S H, Brueck S R, McNeil J R (1994). Diffractive techniques for lithographic process monitoring and control. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer, doi:
Naqvi S S, Krukar R H, McNeil J R, Franke J E, Niemczyk T M (1994). Etch depth estimation of large-period silicon gratings with multivariate calibration of rigorously simulated diffraction profiles. JOSA A, doi:
Naqvi S S, McNeil J R, Krukar R H, Bishop K P (1993). Scatterometry and the simulation of diffraction-based metrology. Microlithogr. World, doi:
Gregus J A, Green C A, Yoon E, Ostermayer F W, Hayes T R (1993). Real-time latent image monitoring during holographic fabrication of submicron diffraction gratings. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer, doi:
Krukar R H, Naqvi S S, McNeil J R, Hush D R, Franke J E (1993). Analyzing simulated and measured optical scatter for semiconductor process verification. Machine Vision Applications in Industrial Inspection, doi:
Milner L M, Bishop K P, Naqvi S S, McNeil J R (1993). Lithography process monitor using light diffracted from a latent image. Integrated Circuit Metrology, Inspection, and Process Control VII, doi:
Milner L M, Bishop K P, Naqvi S S, McNeil J R (1993). Stepper focus characterization using diffraction from latent images. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer, doi:
Hickman K C, Gaspar S M, Bishop K P, Naqvi S S, McNeil J R (1992). Use of diffracted light from latent images to improve lithography control. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer, doi:
Milner L M, Hickman K C, Wilson S M, Bishop K P, Naqvi S S (1992). Latent image exposure monitor using scatterometry. Integrated Circuit Metrology, Inspection, and Process Control VI, doi:
Naqvi S S, Gaspar S, Hickman K, Bishop K, McNeil J R (1992). Linewidth measurement of gratings on photomasks: a simple technique. Applied optics, doi:
Naqvi S S, Gallagher N C (1990). Analysis of a strip-grating twist reflector. JOSA A, doi:
Naqvi S S, Gallagher N C (1990). A general solution to the scattering of electromagnetic waves from a strip grating. Journal of Modern Optics, doi:
Naqvi S S, Gallagher N C (1990). Comments on Electromagnetic wave scattering by an infinite plane metallic grating in case of oblique incidence and arbitrary polarization. IEEE transactions on antennas and propagation, doi:
Naqvi S S (1990). A comment on the use of TE/TM polarization notation. IEEE transactions on antennas and propagation, doi:
Refereed Proceedings
McNeil J R (2000). Scatterometry applied to microelectronics processing. 2000 Digest of the LEOS Summer Topical Meetings. Electronic-Enhanced Optics, :
McNeil J R, Coulombe S A, Logofatu P C, Raymond C J, Naqvi S S (1998). Application of optical scatterometry to microelectronics processing. Technical Digest. Summaries of Papers Presented at the Conference on Lasers, :
Coulombe S A, Logofatu P C, Minhas B K, Sohail S, Naqvi H (1998). Ellipsometric-Scatterometry for sub-0.1 m CD measurements [3332-31]. PROCEEDINGS-SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, :
Raymond C J, Naqvi S S, McNeil J R (1997). Resist and etched line profile characterization using scatterometry. Metrology, Inspection, and Process Control for Microlithography XI, :
Hatab Z R, Ahmed N U, Naqvi S S, McNeil J R (1997). Optical diffraction tomography for latent image metrology. Metrology, Inspection, and Process Control for Microlithography XI, :
Zaidi S H, McNeil J R, Naqvi S S (1997). Scatterometric process monitor for silylation. Metrology, Inspection, and Process Control for Microlithography XI, :
Topi D S (1997). Scatterometric Process Monitor for Silylation. Metrology, Inspection, and Process Control for Microlithography, :
Raymond C J, Naqvi S S, McNeil J R (1996). Scatterometry for CD measurements of etched structures. Metrology, Inspection, and Process Control for Microlithography X, :
Prins S L, McNeil J R, Naqvi S S, Hosch J W (1996). Scatterometric sensor for PEB process control. Metrology, Inspection, and Process Control for Microlithography X, :
Raymond C J, Murnane M R, Prins S L, Naqvi S S, McNeil J R (1996). Multiparameter CD measurements using scatterometry. Metrology, Inspection, and Process Control for Microlithography X, :
Murnane M R, Raymond C J, Prins S L, Naqvi S S, McNeil J R (1995). Scatterometry for 0.24-0.70 um developed photoresist metrology. Integrated Circuit Metrology, Inspection, and Process Control IX, :
Wilson S M, Naqvi S S, McNeil J R, Marchman H M, Johs B D (1995). Metrology of etched quartz and chrome embedded phase shift gratings using scatterometry. Integrated Circuit Metrology, Inspection, and Process Control IX, :
Wilson S M, Naqvi S S, McNeil J R, Marchman H M (1995). Metrology of etched quartz and chrome embedded phase shift gratings using scatterometry [2439-51]. PROCEEDINGS-SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, :
Zaidi S H, Prins S L, McNeil J R, Naqvi S S (1994). Metrology sensors for advanced resists. Integrated Circuit Metrology, Inspection, and Process Control VIII, :
Wilson S M, Marchman H M, Naqvi S S, McNeil J R (1994). Phase-shift mask metrology using scatterometry. 14th Annual BACUS Symposium on Photomask Technology and Management, :
Hatab Z R, Prins S L, McNeil J R, Naqvi S S (1994). 16 MB DRAM trench depth characterization using dome scatterometry. Integrated Circuit Metrology, Inspection, and Process Control VIII, :
Raymond C J, Murnane M R, Naqvi S S, McNeil J R (1994). Scatterometric sensor for lithography [2336-05]. PROCEEDINGS-SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, :
Murnane M R, Raymond C J, Hatab Z R, Naqvi S S, McNeil J R (1994). Developed photoresist metrology using scatterometry. Integrated Circuit Metrology, Inspection, and Process Control VIII, :
Wilson S M (1993). Application of laser scatterometry to characterize phase shifting masks Susan MG Wilson, Gary A. Petersen, S. Sohail H. Naqvi, and John R. McNeil University of New Mexico. Annual Symposium on Photomask Technology and Management: Proceedings, :
Naqvi S S, McNeil J R, Krukar R H, Hatab Z R (1993). Grating parameter estimation using scatterometry. Miniature and Micro-Optics and Micromechanics, :
Farrer S W, Cheng J, Malloy K J, McInerney J G, Naqvi S S (1993). Numerical modeling of a novel TDM digital optical fiber communication link. Multigigabit Fiber Communication Systems, :
McNeil J R, Naqvi S S, Gaspar S M, Hickman K C, Bishop K P (1993). Scatterometry applied to microelectronics processing-part 2. Solid state technology, :
Wilson S M, Petersen G A, Naqvi S S, McNeil J R (1993). Application of laser scatterometry to characterize phase-shifting masks [1809-30]. PROCEEDINGS-SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, :
Wilson S M, Naqvi S S, McNeil J R (1993). Application of laser scatterometry to characterize phase-shifting masks. 12th Annual BACUS Symposium on Photomask Technology and Management, :
Krukar R H, Prins S L, Krukar D M, Gaspar S, McNeil J R (1993). Using scattered light modeling for semiconductor critical dimension metrology and calibration. Integrated Circuit Metrology, Inspection, and Process Control VII, :
Bishop K P, Milner L M, Naqvi S S, McNeil J R, Draper B L (1992). Use of scatterometry for resist process control. Integrated Circuit Metrology, Inspection, and Process Control VI, :
Gaspar S M, Hickman K C, Bishop K P, Naqvi S S, McNeil J R (1991). Laser scatterometry for process characterization. AIP Conference Proceedings, :
Bishop K P, Gaspar S M, Milner L M, Naqvi S S, McNeil J R (1991). Grating line shape characterization using scatterometry. International Conference on the application and Theory of periodic, :
Naqvi S S, Wilson S M, Hickman K C, McNeil J R (1990). Simple technique for linewidth measurement of gratings on photomasks. Integrated Circuit Metrology, Inspection, and Process Control IV, :
Naqvi S S (1990). Scattering from a strip grating placed on a multilayer dielectric sheet. International Symposium on Antennas and Propagation Society, Merging, :
Gallagher N C, Sohail S, Naqvi H (1989). Diffractive optics: scalar and non-scalar design analysis. Holographic Optics: Optically and Computer Generated, :
Naqvi S, Gallagher N, Coyle E (1986). An application of median filters to digital television. ICASSP’86. IEEE International Conference on Acoustics, Speech, and Signal, :
Presentations
International
S. Sohail H. Naqvi (2017). Reforming National Knowledge Systems: A Case Study of Pakistan. SMU-Head Foundation thought leadership series for Higher Education Policy and Management, Singapore, Singapore
Grants
Research
1990[Year 1 of 2]: Naqvi S. Sohail H., Scatterometry application to Semiconductor Processing, Co-Principal Investigator, Semiconductor Research Corporation
This website uses cookies
Cookies are small text files held on your computer. They allow us to give you the best browsing experience possible and mean we can understand how you use our site.
Some cookies have already been set. You can delete and block cookies but parts of our site won't work without them.
By using our website you accept our use of cookies.
Yes, I agree No, I want to find out more